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electrostatic induced lithography
Posted 29 ott 2014, 10:13 GMT-4 Low-Frequency Electromagnetics, Computational Fluid Dynamics (CFD) Version 4.4 0 Replies
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I am trying to simulate electrostatic induced lithography. There are two electrodes and a liquid polymer is on the lower one which is flat while upper one is patterned. This pattern will be replicated in the polymer film (some nm thickness). I am using "two phase laminar flow level set" and "electrostatics" modules. The local film thickness h is a function of x (coordinate along one of the plane of electrode) and time.
Problem: This h depends on electrostatic pressure (as epsilon of air and polymer is different) which in turn is a function of h. The dependent variable available is GI (Reciprocal initial interface distance) which is same for all x, so this cannot be used in equation as h is a function of time. How to use this changed h at every time step and simultaneously using it in the pressure equation, i. e. how to define h and use it in the formula for electrostatic pressure? I also used variable tpf.Dwi for the height but the solution is not converging (after 11%).
Thanks
Hello Shubham Baranwal
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