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Metal film with subwavelength size hole: Transmmittance and reflectance study

Posted 23 dic 2012, 17:26 GMT-5 RF & Microwave Engineering Version 4.3 6 Replies

com_user
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Hi


I'm novice in comsol RF simulation. I'm trying to simulate transmittace and reflectance throught metal film with subwavelength size hole. My structure will consists of Air/metal/semiconductor interface. I'm not sure but I think transmittance is governed by surface plasmon polariton. I tried to find some Model on this topic but could not. I'm looking for models that fits best with mine as well as any suggestion how I should go. I'm trying to understand what is the phenomena that governs the transmittance. Thank you
6 Replies Last Post 12 feb 2013, 20:20 GMT-5
Sergei Yushanov Certified Consultant
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Posted: 1 decade ago 24 dic 2012, 08:29 GMT-5
Reflection and transmission through air/metal/dielectric layers is classical surface plasmon phenomena in Kretschmann-Raether configuration and is governed by evanescent wave propagation at the metal/dielectric interface:
www.ece.rutgers.edu/~orfanidi/ewa/ch08.pdf

Also, search Comsol’ Papers and Presentations website:
www.comsol.com/search/?s=surface+plasmon

Regards,
Sergei
Reflection and transmission through air/metal/dielectric layers is classical surface plasmon phenomena in Kretschmann-Raether configuration and is governed by evanescent wave propagation at the metal/dielectric interface: http://www.ece.rutgers.edu/~orfanidi/ewa/ch08.pdf Also, search Comsol’ Papers and Presentations website: http://www.comsol.com/search/?s=surface+plasmon Regards, Sergei
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Posted: 1 decade ago 18 gen 2013, 16:51 GMT-5
Thank you for your response.... I have one more question regarding this simulation. I'm trying to find the electric field enhancement in metal film with sub wavelength size holes. I was wondering , will it be correct if i make metal film with sub wavelength size hole and apply electric filed with scattering boundary condition. I have confusion on what type of boundary condition should I use.
Thank you for your response.... I have one more question regarding this simulation. I'm trying to find the electric field enhancement in metal film with sub wavelength size holes. I was wondering , will it be correct if i make metal film with sub wavelength size hole and apply electric filed with scattering boundary condition. I have confusion on what type of boundary condition should I use.
Alexander Kuznetsov
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Posted: 1 decade ago 18 gen 2013, 18:08 GMT-5
if will be correct only for an array of periodic holes
if will be correct only for an array of periodic holes
com_user
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Posted: 1 decade ago 4 feb 2013, 12:03 GMT-5
Thank you for your response.

While going through some simulation in RF I found that people are using E field value as 1 . I didn't understand whey they are using 1 is it normalized value or something else??
Thank you for your response. While going through some simulation in RF I found that people are using E field value as 1 . I didn't understand whey they are using 1 is it normalized value or something else??
Sergei Yushanov Certified Consultant
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Posted: 1 decade ago 4 feb 2013, 12:57 GMT-5
Amplitude of the port field can be specified arbitrary. Comsol calculates internally the actual field amplitude based on the port input power – see Power Flow Normalization section in the RF User Guide.

Regards,
Sergei
Amplitude of the port field can be specified arbitrary. Comsol calculates internally the actual field amplitude based on the port input power – see Power Flow Normalization section in the RF User Guide. Regards, Sergei
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Posted: 1 decade ago 12 feb 2013, 20:20 GMT-5
Hi,


I was trying to see electric field enhancement in gold nano foil (30nm) with subwavelength size holes (25nm). I had a structure as shown in figure I applied scattering boundary condition and electric filed of E=1 in y axis, I got electric field enhanced up to 4.3 but this is at the center line dividing the structure in 4 parts as seen in figure. I dont know why electric field enhancement is like that and I'm not sure the value I'm getting (4.3) is enhancement in applied electric field by 4.3 times or not.
Hi, I was trying to see electric field enhancement in gold nano foil (30nm) with subwavelength size holes (25nm). I had a structure as shown in figure I applied scattering boundary condition and electric filed of E=1 in y axis, I got electric field enhanced up to 4.3 but this is at the center line dividing the structure in 4 parts as seen in figure. I dont know why electric field enhancement is like that and I'm not sure the value I'm getting (4.3) is enhancement in applied electric field by 4.3 times or not.

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